| 학회 | 한국고분자학회 |
| 학술대회 | 2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 | 28권 1호, p.24 |
| 발표분야 | 특별 심포지엄 |
| 제목 | Nanoscaled template using Ordered Block copolymer and Supramolecular Self-Assemblies |
| 초록 | Nanoscaled templates can be fabricated using several patterning methods, including E-beam lithography, nanoimprint lithography and replication, block copolymer lithography and focused-ion-beam lithography. Among the lithographic technologies, the patterning method using the self-assembled block copolymer and supramolecules has advantage in the size control and low-cost compared with other methods, since the size and type of the ordered structures can be controlled by changing the molecular weight, the molecular architecture, and the relative fractions of different groups within the molecules. The way in which alignment of hexagonal columnar and cubic mesophases depends on molecular structure, film thickness and surface interactions is investigated. Here, we study a hybrid lithography method of bottom-up and top-down processes to prepare the nanopatterns of ultrahigh-density dot arrays for magnetic recording media and bio-chips. |
| 저자 | 정희태 |
| 소속 | KAIST 생명화학공학과 |
| 키워드 | 분자조립; 나노리소그라피; 블록공중합체; 유기초분자 |
