| 학회 |
한국재료학회 |
| 학술대회 |
2009년 가을 (11/05 ~ 11/06, 포항공과대학교) |
| 권호 |
15권 2호 |
| 발표분야 |
B. Nanomaterilas Technology(나노소재 기술) |
| 제목 |
Surface modification for block copolymer nanolithography on gold surface |
| 초록 |
Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscale periodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled monolayers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by O2 plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, CH3OPh(CH2)3SiCl3]. After O2 plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of O2 plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nanohole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by O2 plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates. |
| 저자 |
황인찬1, 방성환1, 이병주1, 이한보람2, 김형준2
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| 소속 |
1포항공과대, 2연세대 |
| 키워드 |
block copolymer; lithography; gold
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| E-Mail |
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