| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics and Polymers |
| 초록 |
Block copolymer lithography may generate useful device-oriented nanostructures. However, it has been mostly applied to silicon based materials. We present a universal block copolymer lithography process for a broad spectrum of materials covering metals, semiconductors, ceramics, and even polymers. Combining advanced film deposition techniques with block copolymer lithography yielded well-ordered nanostructured films of the various functional materials. The low surface roughness and surface functionality of the target material were crucial for a well-ordered nanotemplate morphology. |
| 저자 |
정성준, Guodong Xia, 김봉훈, 신동옥, Nghiem Quoc Dat, 강상원, 김상욱
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| 소속 |
KAIST 신소재공학과 |
| 키워드 |
블록공중합체; 나노패턴; 금속; 반도체; 세라믹
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| E-Mail |
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