| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
| 권호 |
34권 2호 |
| 발표분야 |
의료용 고분자 부문위원회 |
| 제목 |
Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics and Polymers |
| 초록 |
Block copolymer lithography may generate useful device-oriented nanostructures. However, it has been mostly applied to silicon based materials so far. We present a universal block copolymer lithography process for a broad spectrum of materials covering metals, semiconductors, ceramics and even polymers. Combining advanced film deposition techniques with block copolymer lithography yielded well-ordered nanostructured films of the various functional materials. The low surface roughness and surface functionality of target material were crucial for a well-ordered nanotemplate morphology. |
| 저자 |
문형석, 정성준, 신동옥, 김상욱
|
| 소속 |
KAIST |
| 키워드 |
block copolymer; lithgraphy; nanostructured films; metals; semiconductors; ceramics; polymers
|
| E-Mail |
|
