| 초록 |
Anti-relection (AR) have widely received attentions for improved optical properties. Among them, moth-eye structures have been used for AR-coating because these structures are able to cover broadband spectrum. Refractive index (n) of an AR film must be 1.23 for a glass substrate with n = 1.52 to achieve zero reflectance. However, n of most organic or inorganic materials is higher than 1.23. To control n, nanoporous films are introduced prepared by phase separation of two homopolymers, layer-by-layer assembly, and etc. Here, we are trying to fabricate nanoporous moth-eye films with block copolymer and aluminum anodized oxide(AAO) imprinting. Imprinting PS-b-PMMA with AAO followed by selectively removing PMMA block, nanoporous film with intended n can be achieved. From this nanoporous moth-eye like structure, n of film is expected to increase gradually from n of air to n of film, which can show novel performance in AR-coating. |
