| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 봄 (04/04 ~ 04/06, 대전컨벤션센터) |
| 권호 |
43권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Simultaneous Fabrication of Line and Dot Dual Nanopatterns using Light-Responsive Miktoarm Block Copolymer |
| 초록 |
Block copolymers with various nanodomains have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography. |
| 저자 |
최청룡, 이재용, 안성현, 이규성, 김준, 김진곤
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| 소속 |
POSTECH |
| 키워드 |
miktoarm block copolymer; self-assembly; photo-induced
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| E-Mail |
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