| 초록 |
Chemical surface nanostructures were obtained using self-assembled monolayer patterned by microcontact printing or nanoimprint technique. But these approaches are inadequate at the micron- and sub-micron scales. In this study, we use Si-containing block copolymer lithography for fabricating highly ordered nanoporous SiO2 structures on gold substrates. The materials with silanol end groups self-assembled on the SiO2 surface, while the compounds with the thiol groups on the gold surface. This dual patterned self-assembly method not only form ordered nanostructures over large area, but also control surface property by changing functional groups of self-assembled molecules. These dual patterned surfaces would be further utilized for immobilization materials such as nanopaticles, DNA, and proteins. This patterning technique can be highly useful for the high throughput biosensor and array applications. |
