| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
고분자 구조 및 분석－Scattering & Spectroscopy |
| 제목 |
Block copolymer self-assembly on nanostructured template by colloidal lithography |
| 초록 |
Over the last two decades, block copolymer self-assembly has emerged as a powerful tool for nanopatterning and nanofabrication. Several strategies to direct the self-assembly of block copolymers have been proposed for effective control of block copolymer nanostructures. Especially, chemical/topographic patterns generated by top-down method have been found to be very effective in directing block copolymer self-assembly. In our work, nanopatterns generated by colloidal lithography are used to control nanostructure of block copolymers in thin film. In particular, we concentrate on the registration, pattern dimension match as a function of nanopattern thickness and commensurability of the pattern size with the domain spacing of the block copolymer. The combination of the nanopatterned template and the self-assembly of block copolymers provides a cheap but very promising route to fabrication of various types of nanostructures. |
| 저자 |
이진욱, 김원호, 김세원, 김승현
|
| 소속 |
인하대 |
| 키워드 |
Block copolymer; Nanostructure; Colloidal lithography
|
| E-Mail |
|
