| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 봄 (04/12 ~ 04/13, 대전컨벤션센터) |
| 권호 |
37권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Large-Area, Highly Aligned Lamellar Block Copolymer Nanopatterning Directed by Parallel Cylinder Nanopatterns |
| 초록 |
We present large-area, highly aligned lamellar block copolymer self-assembly directed by graphoepitaxially aligned cylinder block copolymer self-assembly. Asymmetric block copolymer thin films were graphoepitaxially assembled within 1-μm-wide parallel photoresist trenches to generate surface-parallel nanocylinder arrays. After the graphoepitaxial morphology was frozen by a radiative treatment, a thin film of symmetric block copolymer was deposited over the nanocylinder array, where the lamellar period was consistent with the period of the underlying cylinder array. Subsequent thermal annealing generated highly aligned lamellar morphology over a large-area without any trace of an underlying photoresist pattern. Our method employing surface-parallel cylinder self-assembly as a structure-directing chemical pattern for epitaxial self-assembly does not require any substrate surface pretreatment and is, thus, highly efficient for nanopatterning various substrates. |
| 저자 |
문형석, 김봉훈, 신동옥, 김주영, 문정호, 진형민, 최영주, 김상욱
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| 소속 |
KAIST |
| 키워드 |
Block Copolymer; Bi-layer; Large-Area; Highly Orderd; Lithography
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| E-Mail |
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