| 초록 |
Herein, for the first time, a crystalline nickel boride (Ni23B¬6) covered by a few layer hexagonal boron nitride (h-BN) was epitaxially grown on single crystal Ni(111) foil via high-temperature and low-pressure chemical vapor deposition (LPCVD) with an borazine as boron and nitrogen precursors. It was found that as grown h-BN passivating Ni23B6 shows high stability comparison with Ni23B6 during HER in acidic solutions. Microscopic characterizations reveal that the Ni23B6 is epitaxially formed on surface of Ni(111) and subsequently, multilayer h-BN with AA' stacking order was grown on the Ni23B6 surface. |
