화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2015년 가을 (11/04 ~ 11/06, 제주국제컨벤션센터(ICCJEJU))
권호 19권 2호
발표분야 나노_포스터
제목 A study on anti-glare glass with nanostructured surface prepared by the polymer blend lithography and dry etch process
초록 In recent years, cover glass has been widely used for various kinds of applications in display industry such as cell phone, TV, computer, automobile display, etc. However, typical surface reflectivity of cover glass corrupts the user’s view of an image from a display. To meet the market demands, one of the promising approach is Moth-eye AR/AG surface. Here, we have studied to obtain advanced and cost effective Moth-eye AR/AG surface. In order to create pattern, self-assembled soft mask was employed by using polystyrene (PS) and poly (methyl methacrylate) (PMMA). We can easily control the pattern at the range from 200 nm to 1 µm. Afterwards the patterned cover glass was etched with NF3 remote plasma. As the results, we successfully create Moth-eye AR/AG surface.
저자 이승환, 홍승표
소속 국가핵융합(연)
키워드 polymer blend lithography; AR/AG surface; remote plasma
E-Mail