| 초록 |
Colorless photosensitive polyimides have attracted considerable attention in insulation layer for TFT LCD device due to their simple fabrication process. In this study, alkali-developable negative-type photosensitive polyamic acid ester has been prepared by condensation reaction of 1,2,3,4-cyclobutanetetracarboxylic dianhydride (CBDA) and 2-(methacryloyloxy) ethyl 3,5-di aminobenzoate (HEMA-DA) in N-methyl-2-pyrrolidone, followed by esterification reaction using glycidyl methacylate in the presence of triethylamine at 70 ℃. We have varied the degree of esterification (DOE) of the polyamic acid ester and studied the relationship of DOE and photo-patternability. Further, thermal stability, degree of planarization (DOP), and transmittance of photo-cured polyamic acid ester were investigated, which showed extremely high DOP as well as excellent transmittance.
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