| 초록 |
iCVD(initiated chemical vapor deposition) process utilizes very simple machinery with low power consumption. Since the processes are performed at ambient temperature, the CVD polymers are easily applicable to substrate materials vulnerable to liquid phase process and/or heat, such as paper, fabrics, and membranes, without damaging the substrates. Polymeric films can also be easily stacked with sharp interface, free of solvent-related problems. Various chemical modification schemes allow production of new structures and wide tunability of the properties of nano-structures. A deeper insight of materials engineering also enables the development of a novel electronic materials for the applications to various kinds of organic electronic devices. With this platform technology, we are aiming at developing a material system for gate dielectric layers, encapsulation and adhesion promotion layer. |
