| 초록 |
Nanoimprint lithography (NIL) is one of the promising techniques due to its low cost, simple process, and great precision for various electronic applications. Especially, fine patterns below 100 nm pitch by NIL is highly required in display field for the appropriate optical properties. For the realization of 100 nm pitch NIL, photocurable materials based on siloxane or phosphorus moieties were synthesized and characterized because of their potential pattern-forming property and etching resistance. To satisfy various requirements for the fabrication of 100 nm pitch NIL, photocurable mixtures were prepared by the incorporation of various acrylic additives into the siloxanes or phosphorus based compounds. The photocurable mixtures containing organic-inorganic hybrid materials showed high-throughput, good release property, low volumetric shrinkage, and low surface energy. Photocuring behaviors and various NIL pattern properties of organic-inorganic hybrid materials will be discussed. |
