| 학회 |
한국화학공학회 |
| 학술대회 |
2008년 봄 (04/23 ~ 04/25, 제주ICC) |
| 권호 |
14권 1호, p.83 |
| 발표분야 |
고분자 |
| 제목 |
Surface Properties of Poly[2-(perfluorooctyl)ethyl acrylate] Deposited from Liquid CO2 High Pressure Free Meniscus Coating |
| 초록 |
Surface characteristics of poly[2-(perfluorooctyl)ethyl acrylate] (PFOEA) films deposited using a high-pressure free meniscus coating (hFMC) process with liquid CO2 (l-CO2) as a coating solvent on 12.5 cm diameter silicon wafer substrates were investigated using contact angle measurements, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and near-edge X-ray adsorption fine structure (NEXAFS) spectroscopy. The results were compared with surface property measurements of PFOEA films deposited from 1,1,2-trichlorotrifluoroethane (Freon113) under normal dip coating conditions at atmospheric pressure. NEXAFS measurements showed that perfluoroalkyl groups in the films from l-CO2 and Freon113 were well-organized and oriented normal to the substrate at the air/polymer interface. AFM images and XPS measurements revealed that a terrace-like structure of the PFOEA film from l-CO2 resulted in carbonyl group exposure at the air/polymer interface. This leads to smaller contact angles on the films cast from l-CO2 relative to the specimens deposited from Freon113. |
| 저자 |
김재훈1, Ruben G. Carbonell2, 김재덕1
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| 소속 |
1한국과학기술(연), 2North Carolina State Univ. |
| 키워드 |
Poly[2-(perfluorooctyl)ethyl acrylate]; surface properties; High-pressure dip-coating
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| E-Mail |
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| 원문파일 |
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