| 학회 |
한국고분자학회 |
| 학술대회 |
2017년 봄 (04/05 ~ 04/07, 대전컨벤션센터) |
| 권호 |
42권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Fabrication of Dot and Line Dual Nanopatterns using Miktoarm Block Copolymer Capable of Photo-Induced Phase Transition |
| 초록 |
Block copolymers with various nanodomains have received great attention for their applicability to nanolithography. However, nanodomains having a single shape are only achieved at a given block copolymer, because the volume fraction of block thermodynamically controls its nanodomains. However, nanopatterns with multiple shapes and sizes are required for the next-generation nanolithography. In this study, we synthesized a novel miktoarm block copolymer capable of cleavage of one block chain by ultraviolet. By ultraviolet irradiation, original cylindrical nanodomains were successfully transformed to lamellar nanodomains. We demonstrated thin film showed perpendicularly oriented cylindrical and lamellar nanodomains. Since the dual nanopatterns are easily obtained in a large area, this technique could be employed as next-generation nanolithography. |
| 저자 |
최청룡, 박지철, K.L. Vincent Joseph, 이재용, 안성현, 곽종헌, 김진곤
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| 소속 |
POSTECH |
| 키워드 |
Photo-induce; Phase transition; Block copolymer; Self-assembly; Dual-patterns
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| E-Mail |
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