| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 가을 (10/10 ~ 10/11, 부경대학교) |
| 권호 |
28권 2호, p.92 |
| 발표분야 |
특별 심포지엄 |
| 제목 |
X-ray specular reflectivity studies of nanoporous methylsilsesquioxane films |
| 초록 |
X-ray specular reflectivity measurements were performed on nanoporous methyl silsesquioxane (MSSQ) films that were generated by incorporation of a sacrificial polymeric component into the matrix and subsequently removed by thermolysis. Poly(propylene imine) dendrimer was used as pore generator (porogen). Using synchrotron radiation the reflectivity was followed over 9 orders of magnitude. Analysis was performed by fitting the data to reflectivities calculated from models using Parratt theory. Fitting the data also required that the various interfaces have different thicknesses. By evaluation of the critical angle of total reflection of the film material, which was observed at smallest angle, in particular the film electron density could be determined with a high accuracy. Film porosities could be estimated from the observed changes in the electron densities. |
| 저자 |
황용택1, 오원태2, 박영희3, 이병두4, 이문호5
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| 소속 |
1포항공대 환경공학부, 2기능성분자집합체연구센터, 3분자생명과학부BK21사업단, 4포항공대 화학과, 5포항산업과학(연) |
| 키워드 |
x-ray reflectivity; nanoporous thin film; low-k
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| E-Mail |
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