| 초록 |
This work presents a novel one-step process to fabricate a silver thin layer on PET film through atmospheric pressure plasma under low temperature and without using any toxic reagents. The morphology and characteristic of developed silver thin film are carefully investigated through HRSEM, SEM-EDS, XRD and AFM. In order to optimize the electromagnetic shielding effectiveness (EMI SE), the film thickness, morphology and porosity are controlled by changing the dropped volume of precursor solution. Furthermore, the developed method can be also considered to fabricate alloy thin layers for EMI SE. |
