| 초록 |
Solvent vapor annealing (SVA) is well-known for its effectiveness to eliminate the defects and realize the long-range-ordering of the self-assembled nanopatterns of block copolymer thin films. However, due to the lowered Flory-Huggins interaction parameter (χ) during the swollen state, the resultant nanopatterns inevitably suffer from the intermixing between PS and PMMA chains that significantly deteriorates the etching quality. Fortunately, the subsequent thermal annealing (TA) can be applied to enhance the nanodomain purity with the aid of the short-range-segregation. We quantitatively demonstrate the effectiveness of the combined annealing procedure (SVA+TA) in a model system of high-molecular-weight polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) thin film, by means of grazing-incidence small-angle X-ray scattering and infrared nanospectroscopy. |
