| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 봄 (04/04 ~ 04/06, 대전컨벤션센터) |
| 권호 |
43권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Peeling off method for producing smooths self-assembled monolayer on organic gate insulator interface for high-performance OTFT |
| 초록 |
The surface treatment on the organic gate insulator (OGI) is one of the key elements in OTFTs that affect device performance. A self-assembled monolayer (SAM) such as octadecylphosphonic acid (ODPA) is a widely used method for modify the electrical property. Recently, we report the metal-oxide assisted SAM treatment (MAST) method for surface treatment of OGI layer. However, ODPA has a good bonding strength to the surface, which cause aggregation to form small particles and adversely affects device performance. Here, we demonstrate a method to prepare a smooth monolayer of ODPA using the secondary peeling off method. A PDMS solution having a sticky property can be coated on the ODPA layer and peel-off to successfully remove undesired ODPA small particles. Thus, a very smooth ODPA monolayer was obtained onto the a-Al2O3-deposited OGI film and the mobility of DNTT TFTs improved by max 2.16 times compared to devices using OGI without peeling-off surface treatment. |
| 저자 |
하태욱1, 유성미1, 김동균1, 원종찬1, 최동훈2, 김윤호1
|
| 소속 |
1한국화학(연), 2고려대 |
| 키워드 |
surface treatment; OTFT; peeling off; self assembled monolayer
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| E-Mail |
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