| 학회 | 한국재료학회 |
| 학술대회 | 2010년 봄 (05/13 ~ 05/14, 삼척 팰리스 호텔) |
| 권호 | 16권 1호 |
| 발표분야 | G. Display (LCD, PDP, OLED) Materials(디스플레이 재료) |
| 제목 | Effects of oxygen partial pressure on the properties of ITO-ZnO composition spread films prepared by combinatorial RF magnetron sputtering |
| 초록 | Transparent thin films of amorphous zinc indium tin oxide (a-ZITO) were prepared by co-sputtering of zinc oxide and indium tin oxide. Effect of oxygen partial pressure on the electrical and optical properties of a-ZITO thin films was investigated. Conductivity, carrier concentration and Hall mobility showed strong dependence on the oxygen partial pressure and these parameters mainly decreased with the increase of oxygen partial pressure. The a-ZITO films deposited at low oxygen partial pressure showed sheet resistance of 13.8 Ω/⇐ and optical transmittance of about 88%. The preferred orientation of the film was changed as the oxygen partial pressure was changed. The role of oxygen vacancies in a-ZITO films could be discussed in relation to the carrier transport properties and amorphous strictures. |
| 저자 | Hyun Kee Lee1, Tae-Won Kim2, Young-Je Jo3, Jin Hyeok Kim4, Gi-Seok Heo5 |
| 소속 | 1Photonic and Electronic Thin Films Laboratory, 2Department of Materials Science & Engineering, 3Chonnam National Univ., 4Gwangju 500-757, 5Korea |
| 키워드 | : a-ZITO (Zn-In-Sn-O); ITO; ZnO; Combinatorial; Oxygen partial pressure |
