| 초록 |
Supramolecular sef assembly has been big interest as new solution for block copolymer or other bottom up lithography. It has great advantages not only for building nano structures by easy method but also tuning the film surface properties by end-functionalized polymer. We used two end-functionalized polymers which are mono-end-sulfornated polystyrene(SPS) and mono-end-aminated poly(2-vinylpyridine)(AP2VP). Its behavior looks like block copolymer self assembly because each functionalized group makes ionic bonding. We annealed film using several solvents(benzene, chloroform, ethanol, etc..) to control its morphology. Then, We obtained nanoporous structures which has |
