| 초록 |
Polyimide is mainly used in fields requiring strong organic materials due to its excellent heat resistance, mechanical strength, chemical resistance, and insulating properties. In addition, by introducing a photoreactive group into the side chain, researches applied to LC alignment layers, photo-patterning and semiconductor materials are being actively conducted. In this study, a novel photoreactive polyimide was synthesized and analyzed, and photo-alignment properties were evaluated for application to retardation film. the structure and photoreactivity of the polymer were investigated through FT-IR, NMR and UV-Vis spectroscopy. As a result of measuring the Td and Tg through TGA and DSC, they were 350℃ and 165℃, respectively, and excellent thermal stability was expected. By manufacturing a retardation film and analyzing photo-alignment properties such as POM, retardation, order paramter and color difference, the applicability of the film to a photo-alignment material was confirmed. |
