학회 |
한국고분자학회 |
학술대회 |
2004년 가을 (10/08 ~ 10/09, 경북대학교) |
권호 |
29권 2호, p.181 |
발표분야 |
고분자 구조 및 물성 |
제목 |
Autophobic Dewetting of PS/dPS-b-PVP Blend Thin Films |
초록 |
The stability of polystyrene (PS) films on silicon oxide was improved by blending with symmetric deuterium-labeled polystyrene-block-poly(2-vinylpyridine) (dPS-b-PVP). Above 3 wt% loading of dPS-b-PVP in blend thin films, however, autophobic dewetting occurred. The autophobic dewetting of PS/dPS-b-PVP blend thin films was investigated by optical microscopy (OM) and atomic force microscopy (AFM). Moreover, the normalized interfacial excess (ξ = z*PS/Rg,PS) of the deuterium-labeled block copolymer, which was diffused to the silicon oxide layer by annealing, was determined using dynamic secondary ion mass spectrometry (DSIMS). The values of ξ increases as dPS-b-PVP content increases, but it is fixed to 0.365 above 3 wt% and the areal density of segregated dPS-b-PVP is also settled. The segregation of dPS-b-PVP toward the silicon oxide layer brings about the entropy difference between PS molecules and dPS block in dPS-b-PVP, which leads to the autophobic dewetting of PS films on the segregated dPS-b-PVP layer. |
저자 |
강희만1, 김범준2, 이승헌3, 차국헌4, Edward J. Kramer5
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소속 |
1서울대, 2Materials Research Laboratory, 3Univ. of Calif., 4Santa Barbara, 5USA. |
키워드 |
autophobic dewetting; PS/dPS-b-PVP blend thin film; normalized interfacial excess; areal density; entropy difference
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E-Mail |
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