| 초록 |
A novel patterning technique is proposed that combines a top-down and a bottom-up strategy. In this study, we fabricated dually patterned self-assembled monolayers (SAMs) by patterning a silicon-containing photoresist on a gold substrate. The substrate was chemically and topographically patterned to give silicon oxide and gold surfaces. The surfaces allow two different chemical functionalities, in this case, silane and thiol compounds, to be reacted to silicon oxide and gold surfaces, respectively. We control the surface properties by changing the functional groups of SAMs. These patterned functional groups can be able to position various molecular components selectively on the patterned surfaces. These functional groups on dually patterned SAMs are very suitable for the selective adsorption of various materials from nanoparticles to biomolecules. This patterning strategy will be useful for the development of high-throughput platforms for molecular electronics and sensors. |
