화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2019년 봄 (04/10 ~ 04/12, 부산컨벤션센터(BEXCO))
권호 44권 1호
발표분야 고분자합성
제목 synthesis of Positive-type Photoresist using PBO with various end groups.
초록 Polybenzoxazoles were synthesized by polymerizing various polyhydroxyamide precursors and it was confirmed that Pattern performed well using SEM which was confirmed to be synthesized using FT-IR and FT-NMR. PHA was synthesized using 0.2 eq of phthalic, Succinic anhydride, and maleic anhydride was synthesized at 0.1, 0.2, 0, 3 eq. All PHA synthesized was well dissolved in a flying solvent such as NMP, DMAc, DMSO. All synthesized PHAs were well dissolved in solvents such as NMP, DMAc, DMSO and others. Aligner uses MIDAS's MDA-400S and give energy of 450 mJ using the 365 nm I-line wavelength. Develop was carried out using tetramethylammonium hydroxide aqueous solution 2.38%, and the development time was adjusted in order to form the best line. As a result, phthalic anhydride and succinic anhydride got inappropriate results, maleic anhydride was able to obtain very excellent results, good results were obtained in the order of 0.2, 0.1, 0.3.
저자 박주현, 윤정, 신요섭, 이승우
소속 영남대
키워드 PHA; PBO; Photoresist
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