| 초록 |
Recently, we introduced “secondary sputtering lithography” (SSL), a patterning technique that can be used to fabricate ultrahigh-resolution (10 nm), three-dimensionally complex structures with high aspect ratios over large areas by utilizing plasma processing and without requiring specialized equipment. This technique has many advantages. First, SSL can enable the fabrication of high-resolution 10 nm-scale 3D structures from a microsized master pattern (100 nm to ∼10μm). In addition, SSL can be used to produce various complex 3D nanostructures, such as line patterns and cup/ hollow-cylinder-shaped patterns, at a resolution of 10 nm and an aspect ratio of ∼30 because this method can transfer the 3D side surface shape of organic prepatterns to 3D inorganic structures with walls having widths of 10 nm. Lastly, SSL can be applied to most inorganic materials, as this technique involves the physical etching of plasma ions and not a chemical process. |
