| 학회 | 한국재료학회 |
| 학술대회 | 2016년 가을 (11/16 ~ 11/18, 경주 현대호텔) |
| 권호 | 22권 2호 |
| 발표분야 | H. 한-일 재료공학 워크샵 |
| 제목 | Micro/nanostructuring and surface modification of silicone rubber by vacuum UV laser |
| 초록 | Silicone ([SiO(CH3)2]n) is one of the chemically stable polymers and has excellent properties for optically transparent, chemically and thermally resistant, and electrically insulating uses. In our previous work, a silicone rubber surface was photochemically modified into carbon-free silica (SiO2), accompanied by swelling of 157 nm-F2 laser irradiated area [1]. The use of the F2 laser is essential for accomplishing the photochemical reactions; active oxygen [O(1D)] atoms can be effectively obtained through the photodecomposition of O2 molecules in air. The strong oxidation reaction can take place on the silicone rubber surface with the O(1D) atoms. On the basis of the photochemical modification, SiO2 optical waveguides or SiO2 microlenses were successfully fabricated on a flexible substrate of silicone rubber [2]. In this report, the periodic micro/nanostructuring of silicone rubber surface was induced by the irradiation of 193 nm ArF excimer laser. The ArF laser was focused on the surface of silicone rubber by each microsphere made of silica glass of 2.5 m diameter, which covered the entire surface of the silicone. The silicone rubber surface underneath each microsphere selectively swelled due to the photodissociation of Si-O bonds of silicone into the lower molecules during the laser irradiation. To see hydrophobicity of the samples, contact angle of water was measured. Thus, it showed approximately 150 degrees and over on the micro/nanostructured silicone, indicating a clear super-hydrophobic property. |
| 저자 | Masayuki OKOSHI1, Wisnu Setyo PAMBUDI2, Hidetoshi NOJIRI1, Tsugito YAMASHITA2 |
| 소속 | 1National Defense Academy, 2Japan |
| 키워드 | ArF excimer laser; Silicone; Micro/Nanostructure; Hydrophobicity; Microsphere |
