| 초록 |
Block copolymers have attracted much interest to nanopatterning as they provide well-ordered nanostructure due to their ability to self-assemble at a scale of tens of nanometer. To fabricate thin film with well-ordered nanodomains, efficient method for solvent-induced microphase separation of block copolymer emerged, triggering great interest. We studied the effect of solvent annealing system on the morphology of block copolymer thin films. A significant challenge in block copolymer films is the difference in behavior for thin films when solvent effect can influence the orientation and ordering of the microdomains, resulting in well-ordered microdomain in block copolymer thin films. The films were characterized using scanning probe microscope(SPM). |
