| 초록 |
Fabricating curvature structures is researched worldwide for application in optical materials, superhydrophobic materials, and smart adhesives. Conventional lithography faces 2D-limitation because it is transferring target materials structure to substrate using a polymer. Recently, interference lithography and colloidal lithography have been developed for overcoming this matter. But they use repetition occurring in contact with light and polymer and it is only possible to produce repetitive structure so there is a limitation in position precision. Our group have developed a new patterning process for high-curvature structure using expansion of a gas trapped in a pattern. To control size of structure is possible by regulating polymer properties and process conditions. This technology can produce a polymer substrate with continuous and uniform high-curvature structure, expanding the research scope in various fields. Also, it is expected to have great academic/industrial effects. |
