화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2022년 봄 (05/11 ~ 05/13, 제주국제컨벤션센터(ICC JEJU))
권호 26권 1호
발표분야 포스터-콜로이드·계면화학
제목 Preparation of High Concentration Colloidal Silicawith of Monodispersive Spherical Particles Starting from Tetramethoxysilane(TMOS) Precursor.​
초록  The synthesis method of high purity monodisperse spherical colloidalsilica was developed using tetramethoxysilane (TMOS) in presence of basecatalyst solution which is (2-hydroxyethyl)trimethylammonium hydroxide[(2-HyEt)TriAH] base on eco-friendly biomass. This reaction was carried out bysupplying two types of reactant (TMOS and catalyst solution) using aperistaltic pump at the same time and hydrolysis/condensation of TMOS with anaqueous solution (pH=9-10) at 90-100 ℃, while simultaneously distilling offmethanol, by-product. In results, the high concentration of colloidal silica(15, 20, 25 and 30 nm) was produced. This process has the advantage of beingable to freely control the silica contents and decrease the synthesis processtime. In this presentation, we will discuss the synthesis method ofhigh-concentration and yield spherical colloidal silica in detail.
저자 김대진1, 유복렬2
소속 1KIST / 고려대, 2KIST / UST
키워드 Colloidal silica; TMOS; 2-(hydroxyethyl)trimethylammonium hydroxide
E-Mail