| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
신기능 나노표면, 계면 및 박막 |
| 제목 |
Lithography using Block copolymer Baroplasticity |
| 초록 |
Block copolymers with baroplasticity could be easily processed at a lower pressure. In this work, polystyrene-block-poly(n-pentyl methacrylate)[PS-b-PnPMA] was used for the nano patterning by Atomic force microscope (AFM). Comparison with other polymers indicates that high density pattern with nanometer sizes was achieved from PS-b-PnPMA thin film at room temperature. This could be used for a high-density data storage application using 2 bites (0 and 1). Acknowledgement: This work was supported by Creative Research Initiative Program supported by KOSEF |
| 저자 |
조아라, 주원철, 김진곤
|
| 소속 |
포항공대 |
| 키워드 |
Lithography; Block copolymer; Baroplasticity
|
| E-Mail |
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