| 학회 |
한국고분자학회 |
| 학술대회 |
2007년 봄 (04/12 ~ 04/13, 제주 ICC) |
| 권호 |
32권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Synthesis of Photosensitive Preceramic Silazane Oligomers for Photopatterning |
| 초록 |
Oligomeric vinylsilazanes (OVSiN) are commonly used for the fabrication of non-xoide ceramic structures usually by heat curing and then pyrolysis. In order to synthesize photocurable OVSiN for curing at room temperature, photosensitive acrylate groups were introduced to the backbone through a reaction between NH of OVSiN and isocyanate of 1,1-bis(acryloyloxyethyl)ethyl isocyanate and the reaction was characterized by 1H-NMR and IR spectra. The photosensitivity of the acrylated OVSiN was investigated by DPC, UV absorption, and IR spectroscopy. The acrylated OVSiN formulations mixed with 5 wt% of a photoinitiator were found to be cured within 30 sec by UV irradiation with about 10 mwatt/cm2 at 365nm. The fabrication of ceramic patterns using the acrylated OVSiN was also discussed. |
| 저자 |
이의화1, 김동표2, 안광덕1, 강종희3, 김준영3, Xiao Dong Li3
|
| 소속 |
1충남대, 2China, 3한국과학기술(연) |
| 키워드 |
Oligomeric Vinylsilazane; acrylated Vinylsilazane; Photosensitive preceramic; photocuring
|
| E-Mail |
|
