| 학회 |
한국고분자학회 |
| 학술대회 |
2017년 봄 (04/05 ~ 04/07, 대전컨벤션센터) |
| 권호 |
42권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Perpendicular orientation of block copolymer by random copolymer brush: the effect of grafting density |
| 초록 |
A perpendicular orientation of lamella-forming block copolymer (BCP) has been an issue for nanopattern formation in thin film morphology. A simple method of grafting random copolymer (r-CP) brush to the silicon oxide substrate has been suggested for inducing perpendicular lamellae by neutralizing the interfacial interaction between the substrate and each block of BCP. In this study, we experimentally controlled the grafting density (σ) of a random copolymer P(S-r-MMA) and assessed its effect on the thickness window of the perpendicularly-aligned PS-b-PMMA microdomains. The result was supported by coarse-grained simulation that reconfirms the existence of the minimal σ for shielding the interfacial interactions. |
| 저자 |
이우섭1, 박성민1, 김영식1, 전승배1, Vaidyanathan Sethuraman2, Nathan Rebello2, Venkat Ganesan2, 류두열1
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| 소속 |
1연세대, 2Univ. of Texas at Austin |
| 키워드 |
PS-b-PMMA; lamella; grafting density; interfacial; interaction; perpendicular; random copolymer; block copolymer
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| E-Mail |
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