| 학회 | 한국고분자학회 |
| 학술대회 | 2002년 가을 (10/11 ~ 10/12, 군산대학교) |
| 권호 | 27권 2호, p.71 |
| 발표분야 | 특별 심포지엄 |
| 제목 | The phase behavior of block copolymer and homopolymer mixture in thin film and bulk |
| 초록 | Block copolymers which self-assemble to make periodic structures with well-defined size and spacing of tens of nanometers length scale have attracted a lot of attention due to their potential usage as functional nanostructures. Previously, We suggested a block copolymer and homopolymer mixture in thin film as a good way by which controllability in lateral distance and size of microdomains is possible.[1] In this study, we compare the morphological difference between thin films and bulks depending on interaction strength between homopolymer and two block segments in the block copolymer. The mixtures consist of polystyrene-b-poly(methylmethacrylate) (PS-PMMA) and homopolymers of PMMA or poly(ethylene oxide) (PEO). Since PEO has a specific interaction with PMMA block, but high repulsion against PS block, most PEO chains were located in the central region in PMMA blocks, irrespective of thin film and bulk state. Furthermore the macrophase separation was not observed even at high amounts of PEO in PMMA microdomains, inducing morphological change from HEX to LAM. Contrary to PEO, due to the weak repulsive force between PMMA homopolymer and PS block, the location of PMMA homopolymers was strongly dependent of the molecular weight of PMMA homopolymers. The phase separation was also very sensitive to the amount and molecular weight of PMMA homopolymers. [1]. Adv. Mater. 14, 274 (2002) |
| 저자 | 정운용, 고동한, 류두열, 김진곤 |
| 소속 | 포항공대 화공과 |
| 키워드 | block copolymer; thin film; phase separation |
| VOD | VOD 보기 |
