| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 |
28권 1호, p.371 |
| 발표분야 |
특별 심포지엄 |
| 제목 |
High Performance Antireflection Layer Using Soft-Lithographically induced Surface Relief Gratings |
| 초록 |
Antireflection (AR) coatings play an important role in a wide variety of optical technologies and display devices by reducing reflective losses at interfaces. In this work, we report the reduction of surface reflection losses by fabricating an AR structure with subwavelength motheye surface patterns in the substrate. The motheye AR patterning works by creating a region of gradually varying effective refractive index between air and AR layers. The motheye AR structures were created by exposing the surface of the azobenzene polymer films to the interference patterns of Argon ion laser beams and subsequent molding transparent replica films. The photo-fabricated motheye structures were confirmed by measuring the AFM images and the antireflection effect was characterized. |
| 저자 |
유성종;김미정;염준호;성영은;김동유 |
| 소속 |
광주과학기술원 신소재공학과;광주과학기술원 신소재공학과;광주과학기술원 신소재공학과;광주과학기술원 신소재공학과;광주과학기술원 신소재공학과 |
| 키워드 |
Antireflection; Azobenzene; Motheye; soft lithography; surface relief grating
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