| 초록 |
Using intense flash light, we fabricated sub-10 nm directly self-assembled nanopatterning with high χ block-copolymer. With high χ block-copolymer, using flash light is useful due to its high reliability, compatibility for scale up to large area, and ultrafast process at milisecond scale. Millisecond-scale photo-thermal process with high temperature induces large grain growth without thermal degradation or dewetting. Photo-thermal effects of block-copolymer self-assembly for ordered structures are investigated based on the kinetics and thermodynamics. Flash light process is combined with graphoepitaxy to prove directed self-assembly over large area. Thereby, flash light nanopatterning can be widely used to next-generation nano-device applications due to its effective applicability to roll-to-roll process. |
