화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2021년 봄 (04/07 ~ 04/09, 대전컨벤션센터)
권호 46권 1호
발표분야 고분자구조 및 물성
제목 Scalable manufacturing of heat-tolerant Titanium Nitride broadband absorber in visible light to near-infrared with multiple patterning of colloidal lithography
초록 Broadband perfect absorbers have been intensively researched for decades because of their near-perfect absorption optical property that can be applied to diverse applications. Unfortunately, achieving large-scale and heat-tolerant absorbers has been remained challenging because of costly and time-consuming lithography methods and thermolability of materials. Here, we demonstrate a thermally robust titanium nitride broadband absorber with > 95 % absorption efficiency in the visible and near-infrared region (400-900 nm). A large-scale absorber device is fabricated by using a fabrication technique of multiple-patterning colloidal lithography. The optical properties of the absorber are still maintained even after heating at the temperatures > 600 °C. Such a large-scale, heat-tolerant and broadband near-perfect absorber will provide further useful applications in solar thermophotovoltaics, stealth and absorption controlling in high-temperature conditions.
저자 고명철, 김진곤
소속 포항공과대
키워드 colloidal lithography; multiple patterning colloidal lithography; refractory plasmonics
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