| 학회 |
한국공업화학회 |
| 학술대회 |
2015년 가을 (11/04 ~ 11/06, 제주국제컨벤션센터(ICCJEJU)) |
| 권호 |
19권 2호 |
| 발표분야 |
고분자_포스터 |
| 제목 |
Fabrication of polycyclic aromatic hydrocarbon oligomers-based pyrolytic carbon patterns via masked ion beam lithography and heat treatment |
| 초록 |
The generation of pyrolytic carbon patterns from a thin film of polycyclic aromatic hydrocarbon oligomers (PAHs) was investigated by masked ion beam lithography and subsequent heat treatment. PAHs thin films spin-coated on a substrate were patterned by masked proton beam lithography to form PHAs patterns. The resulting patterns were then pyrolyzed at 800, 900, and 1000 oC. Based on the analytic results, the fluence of 3 x 1015 ions/cm2 was optimum to form the well-defined PAHs patterns. Moreover, the precursory PAHs patterns were successfully converted to the pyrolytic carbon patterns by the pyrolysis, which was dependent on the pyrolysis temperature. |
| 저자 |
최재학1, 정진묵1, 정찬희2, 신준화2, 황인태2, 정창희2, 우현수1
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| 소속 |
1충남대, 2한국원자력(연) |
| 키워드 |
lithography; polycyclic aromatic hydrocarbon oligomers; ion beam
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| E-Mail |
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