화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2019년 가을 (10/30 ~ 11/01, 제주국제컨벤션센터(ICC JEJU))
권호 23권 2호
발표분야 (특별세션) 에너지국제공동R&D 연구발표회
제목 HIGHLY EFFICIENT N-TYPE SILICON SOLAR CELLS WITH PASSIVATING CONTACT STRUCTURE
초록 In the photovoltaic industry, crystalline silicon (c-Si) solar cells using screen-printing technology share the global market over 90%. To realize high efficiency, industrial c-Si solar cells have been developed and consequently interested in n-type wafer-based Si cell technologies, and various cell structures (PERL, HIT). Here, a novel passivation technology reducing the recombination of carriers is important to improve solar cell performance. Especially, tunnel oxide passivated contact (TOPCon) solar cells have been observed to reduce the recombination generated in silicon/back surface field (BSF) layer/metal by inserting ultra-thin SiOx layer between silicon and metal contact. In this study, passivated contact technologies that can improve efficiency(>22%) are summarized. Moreover, studies on the relations between the poly-Si layer and tunnel oxide (SiOx), hydrogenation are examined with suggesting new hybrid solar cell structure combined with two passivating contact technologies.
저자 이해석, 이해석
소속 고려대
키워드 solar cell; passivated contact; tunnel oxide
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