| 학회 |
한국공업화학회 |
| 학술대회 |
2021년 가을 (11/03 ~ 11/05, 대구 엑스코(EXCO)) |
| 권호 |
25권 2호 |
| 발표분야 |
포스터-환경·에너지 |
| 제목 |
Fluoride Doping PVDF Production and Surface Properties by Plasma Fluorination |
| 초록 |
Fluorination was performed to reduce surface energy of the PVDF thin film and improve hydrophobicity. Plasma fluorination was used for fluorination. Fluorinated the PVDF thin film by changing the flow rate of fluorine gas. The chemical surface properties of fluorinated PVDF thin films were analyzed by X-ray photoelectron spectroscopy (XPS) and physical surface properties by atomic force microscopy (AFM). The hydrophobicity of the incoming PVDF thin film at the water contact angle has been identified. The largest group of fluoride functions was introduced at the highest flow rate. However, if there is too much fluorine flow, the roughness is reduced.This is because the etching of the surface of the PVDF thin film by fluorine gas has increased and the surface has become flat. |
| 저자 |
김석진, 김대섭, 임채훈, 이혜련, 이영석
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| 소속 |
충남대 |
| 키워드 |
PVDF thin film; Fluorination; Hydrophobic; Roughness
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| E-Mail |
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