| 초록 |
Two-dimensional layered materials have been considered as new building blocks that can be assembled into new thin film structures by controlling their lateral and vertical heterostructures. While many novel physical properties have been reported in such films, lack of feasible and reliable assembly techniques makes it difficult to reproduce the structures at large scale. Here, we present two methods, where two-dimensional layered materials are either stitched or stacked to form controlled thin film structures over large area. Using the methods, we have demonstrated atomically thin circuitry as well as the thinnest, chiral optical film for the first time. Our results represent an important step towards developing novel thin film devices, and further development of atomically thin film growth and assembly techniques would provide a powerful platform to design novel atomically thin circuitry for advanced electronic, optical, photovoltaic and biological sensing devices that can be further integrated with existing thin film technology. |
