화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2017년 봄 (04/05 ~ 04/07, 대전컨벤션센터)
권호 42권 1호
발표분야 기능성 고분자
제목 Material exposed to light in regularization for positive-tone photoresists
초록 Photosensitive polyimides(PSPI) have been studied to replace a conventional polyimides. Polyimides have been widely used as buffer layers and dielectric layers for semiconductor devices because of their excellent properties such as high thermal stabilities, chemical resistance and good mechanical properties. However, polyimides contain carbonyl groups in their backbone, so that they have higher water absorption and dielectric constant than less polar polybenzoxazoles(PBO). And PBO properties similar to polyimides. Thus, PBO have received increasing interest in microelectronic industry because they have lower water absorption and dielectric constant than polyimides. Thus, the development of photosensitive polybenzoxazole(PSPBO) was highly anticipated. A conventional PSPBO can be consisted of photo active compound(PAC), esterified diazonaphthoquinone(DNQ) and PBO precursor, PHA(polyhydroxyamide).
저자 윤정, 이승우, 김기승, 서지훈
소속 영남대
키워드 positive-tone photoresists
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