| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
고분자가공/복합재료－나노카본 고분자 복합필름 |
| 제목 |
Pattern formation of gold nanoparticles using masked ion beam irradiation and oxygen plasma etching |
| 초록 |
In this study, the pattern formation of gold nanoparticles (Au NPs) was investigated by means of the combination of ion beam contact lithography and oxygen plasma etching. Polymer thin films containing various amounts of HAuCl4 were selectively irradiated through a pattern mask with energetic ions to generate the polymer patterns containing Au NPs. Afterwards, the polymers were removed by oxygen plasma etching process, resulting in the pattern formation of Au NPs. The patterns were investigated by FE-SEM with an energy dispersive X-ray spectrometer (EDX) before and after oxygen plasma etching. The results of the FE-SEM and EDX analysis revealed that the resolved patterns of Au NPs were formed successfully. |
| 저자 |
강동우1, 정창희2, 정찬희1, 황인태1, 최재학1, 노영창1, 문성용3, 이정수4, 장지현4
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| 소속 |
1한국원자력(연), 2서강대, 3한양대, 4울산과학기술대 |
| 키워드 |
Gold nanoparticle; Patterning; Ion beam; Plasma etching
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| E-Mail |
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