| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Facile Cross-linking Method of Block Copolymer Thin Films for Fabricating 3D Multilayer. |
| 초록 |
Block copolymer(BCPs) lithography has drawn attention thanks to its cost effectiveness, high resolution, and compatibility with well-established processing techniques. Until now, significant effort has been devoted to controlling 2D nano patterns. But there is a future challenge to fabricate more complex 3D nano patterns. . It is possible to preprae 3D nano patterns through LbL stacking via cross-linking BCP layers which allows each layer to be sequentially prepared without perturbing the underlying layers. In the case of PS-b-PMMA, there are several possible strategies for cross-linking bottom layer. First, introducing cross-linking unit into the PS or PMMA chain and second, exposing normal PS-b-PMMA films to UV irradiation. However, each strategy has some drawbacks such as synthetic problems or increasing defect density. In this study, to overcome these limitations, we cross-linked bottom layer by blending cross-linkable PS-r-P(S-N3) additive into PS-b-PMMA matrix polymer. |
| 저자 |
우상훈1, 이수미2, 곽은애2, 정현중1, Craig J. HAWKER3, 허준4, 방준하5
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| 소속 |
1고려대, 2삼성전자, 3Department of Materials, 4UCSB, 5Santa Barbara |
| 키워드 |
cross-linkabe additive; 3D multilayer
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| E-Mail |
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