| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 가을 (10/10 ~ 10/12, 경주컨벤션센터) |
| 권호 |
43권 2호 |
| 발표분야 |
대학원생 구두발표(영어발표, 발표15분) |
| 제목 |
Shear-Solvo Defect Annealing of Diblock Copolymer Thin films over Large Area |
| 초록 |
The defects formed during the microphase separation of block copolymers (BCPs) act as obstacles to leaping from a fundamental understanding of BCP self-assembly to a practical level of bottom-up lithography. Several methods have been proposed, such as increasing chain mobility to remove defects; however, they have difficulty maintaining high orientation in a large area. Here we introduce a reliable and facile approach to generate well-ordered 1D array of nanopatterns with low defects density over centimeter square areas. We show that the shear and subsequent solvent vapor annealing effectively remove defects without disturbing the pattern orientations. The grazing incidence small angle X-ray scattering and microscopic defect quantification were performed to reveal the detailed defect annealing process and the superior quality of nanopatterns was further confirmed with X-ray Bragg diffraction measurement providing an opportunity to application of high efficient optoelectronic devices. |
| 저자 |
김예찬, 김소연
|
| 소속 |
울산과학기술원 |
| 키워드 |
block copolymer; shear; solvent vapor annealing; defect annihilation; metal nanowire
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| E-Mail |
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