| 초록 |
Atomic layer deposition (ALD) and temperature-regulated chemical vapor deposition (TR-CVD) have recently been shown to be as effective for insertion of nanoparticles into the mesoporous templates. ALD or TR-CVD, NiO or Fe2O3 nanoparticles could be incorporated into mesoporous SiO2 and Al2O3 substrates and not only the surface topmost part of the substrate particles but also deeper layers with a depth of several tens to hundreds of micrometer could be decorated by NiO or Fe2O3 nanoparticles. These catalysts were shown to be highly active for low temperature CO, acetaldehyde and toluene and resistant against poisoning by SO2. More recently, our catalysts have been tested for selective catalytic reduction (SCR), and the result shows activation barrier of our catalysts for SCR is lower than that of commercial SCR catalysts. |
