| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 봄 (04/11 ~ 04/12, 대전컨벤션센터) |
| 권호 |
38권 1호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Perpendicular lamellar orientation of Block Copolymers over 100-nm Periods |
| 초록 |
Directed assembly of block copolymer thin films is widely used for nanoscopic templates or scaffolds. A key challenge in this field is to attain the well-developed structure of assembly with more than 100-nm period, because the ordering of long-chained block copolymer is hindered by the very slow chain mobility. We demonstrated a ordering evolution for the thin films of high molecular weight block copolymer assembly on a neutral substrate with the solvent annealing, which was combinatorially developed by the thermal annealing process. This breakthrough strategy, which is applicable to nanolithographic pattern transfer to target materials, suggests a simple and fast route to the demand for the larger feature size of block copolymer assembly. |
| 저자 |
김은혜1, 안형주2, 박성민2, 이호연2, 이문규3, 이수미3, 허준2, 방준하4, 한영수1, 류두열2
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| 소속 |
1한국원자력(연), 2연세대, 3삼성디스플레이, 4고려대 |
| 키워드 |
block copolymer; solvent annealing; line pattern
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| E-Mail |
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