| 초록 |
3D network structures provide potential applications such as photonic crystals, separations, and solar cells. Self-assembly of block copolymer is considered as a key technology to fabricate nanoscale structures and, it has been extensively investigated. In this study, we demonstrate the fabrication of 3D network structures from self-assembly of block copolymer thin films by solvent annealing. The thin film of asymmetric polystyrene-block-polymethyl methacrylate (PS-b-PMMA) were prepared on Si wafer, and exposed to solvent vapor. The structures of block copolymer thin films were investigated using Scanning Force Microscopy (SFM), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Grazing Incidence small-angle X-ray scattering (GISAXS). |
