| 학회 | 한국고분자학회 |
| 학술대회 | 2005년 가을 (10/13 ~ 10/14, 제주 ICC) |
| 권호 | 30권 2호 |
| 발표분야 | 정밀성형 |
| 제목 | Soft-imprint technique for the fabricationd of miro/nano-patterns. |
| 초록 | Here we present a UV-based ‘soft-imprint’ lithography process that makes possible the direct patterning of polymers with features in the submicron range. The proposed technique uses an elastomeric PDMS mold and does not involve temperature cycling or high pressure during processing. In this technique, a PDMS mold with submicron scale relief is placed on a low viscosity monomer, which is then polymerized by exposure to UV light at room temperature. The use of PDMS as the mold material ensures the clean release of the mold from the patterned polymer; thus the release process does not produce defects or distortion in the patterned polymer, as has been found in NIL and SFIL. In the proposed method, the swelling problem of PDMS for organic solvent is overcome through two methods; one is the pre-polymerization before the PDMS mold is put on, and the other is the surface modified PDMS mold by Teflon AF coating. The proposed method is also applied to fabricate the multilevel microstructures with one-step process. Figure 1. SEM images of the various the patterned polymer structures fabricated using soft-imprint technique : (a) cross-sectional and (b) plane-view of patterned polymer lines |
| 저자 | 최원묵, 박오옥 |
| 소속 | 한국과학기술원 생명화학공학과 고분자나노소재 연구실 |
| 키워드 | nanoimprint lithography; soft-imprint; polydimethylsiloxane; microfabrication |
